The reaction-sintered silicon carbide cantilever paddle, as a type of silicon carbide ceramic product made by high-temperature sintering at 1850 ℃, is a key component of the semiconductor wafer loading system. The cantilever paddle has stable performance and a large wafer loading capacity, with no deformation in high temperature environments. It is suitable for automatic robot loading and handling systems. Since the cross-section of the cantilever paddle is stable and not deformed, it is possible to use existing furnace tubes to prepare larger wafers. The thermal expansion coefficient of the cantilever paddle is similar to that of the LPCVD coating. When used in LPCVD, it greatly extends the maintenance and cleaning cycle and greatly reduces contaminants.